Formation mechanism in perovskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabri- cated by rf magnetron sputtering

Formation mechanism in perovskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabri- cated by rf magnetron sputtering
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射频磁控溅射制备(Bi,Ln)(Ni,Ti)O_3薄膜钙钛矿结构的形成机制

DOI:
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发表时间:
2009
期刊:
J. Korean Phys. Soc. (accepted)
影响因子:
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通讯作者:
H. Yamaguchi and K. Honda
H. Yamaguchi and K. Honda
中科院分区:
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文献类型:
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作者:
H. Oshima;M. Kobune;H. Tada;K. Fukushima;D. Horii;A. Tamura;Y. Daiko;A. Mineshige;T. Yazawa;H. Yamaguchi and K. Honda

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