X-ray wavefront analysis and optics characterization with a grating interferometer
X-ray wavefront analysis and optics characterization with a grating interferometer
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DOI：
10.1063/1.1857066
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发表时间：
2005-01
影响因子：
4
通讯作者：
T. Weitkamp;B. Nöhammer;A. Diaz;C. David;E. Ziegler
中科院分区：
文献类型：
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作者：
T. Weitkamp;B. Nöhammer;A. Diaz;C. David;E. Ziegler
我们提出了一种干涉测量方法来测量硬 X 射线波前的形状。干涉仪由作为分束器的相位光栅和作为探测器透射掩模的吸收光栅组成。该装置可用于测量与大至几十米的曲率半径相对应的波前形状梯度，横向分辨率为几微米。这对应于检测到的大约 10−12m 或 λ∕100 的波前畸变。该设备与 12.4 keV X 射线一起使用，测量 X 射线镜的斜率误差和高度轮廓。可以检测周期范围从小于1mm到大于1m的地表坡度变化，精度优于0.1μrad。
We present an interferometric method to measure the shape of a hard-x-ray wavefront. The interferometer consists of a phase grating as a beam splitter and an absorption grating as a transmission mask for the detector. The device can be used to measure wavefront shape gradients corresponding to radii of curvature as large as several dozens of meters, with a lateral resolution of a few microns. This corresponds to detected wavefront distortions of approximately 10−12m or λ∕100. The device was used with 12.4 keV x rays to measure the slope error and height profile of an x-ray mirror. Surface slope variations with periods ranging from less than 1 mm to more than 1 m can be detected with an accuracy better than 0.1μrad.