Potential, Achievements and Issues of InN and Related Alloys for Device Applications
Potential, Achievements and Issues of InN and Related Alloys for Device Applications
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InN及相关合金在器件应用中的潜力、成就和问题
DOI:
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发表时间:
2008
期刊:
影响因子:
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通讯作者:
Y. Nanishi
中科院分区:
文献类型:
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作者:
D. Muto;H. Naoi;S. Takado;T. Araki;and Y. Nanishi;Daisuke Muto;D.Muto;中谷佳津彦;福本英太;T. Yamaguchi;Y. Takagi;Y. Nanishi;H. Nozawa;V. Darakchieva;武藤大祐;山口智広;高木悠介;野沢浩一;Y. Nanishi