Development of INTPIX and CNTPIX Silicon-On- Insulator Monolithic Pixel Devices

Development of INTPIX and CNTPIX Silicon-On- Insulator Monolithic Pixel Devices
复制标题

DOI:
--
复制
发表时间:
2010
期刊:
--
影响因子:
--
通讯作者:
K. Hara;Y. Ikegami;N. Kuriyama;Y. Fujita;A. Takeda;S. Terada;J. Uchida;T. Tsuru;K. Koike;T. Sega;D. Nio;T. Kohriki;K. Shinsho;K. Hanagaki;I. Kurachi;M. Motoyoshi;N. Miura;Y. Ikemoto;H. Kasai;R. Ichimiya;Y. Arai;M. Kochiyama;Y. Horii;T. Tsuboyama;S. G. Ryu;K. Tauchi;M. Okihara;Y. Unno;T. Miyoshi;Y. Onuki
K. Hara;Y. Ikegami;N. Kuriyama;Y. Fujita;A. Takeda;S. Terada;J. Uchida;T. Tsuru;K. Koike;T. Sega;D. Nio;T. Kohriki;K. Shinsho;K. Hanagaki;I. Kurachi;M. Motoyoshi;N. Miura;Y. Ikemoto;H. Kasai;R. Ichimiya;Y. Arai;M. Kochiyama;Y. Horii;T. Tsuboyama;S. G. Ryu;K. Tauchi;M. Okihara;Y. Unno;T. Miyoshi;Y. Onuki
中科院分区:
其他
文献类型:
--
作者:
K. Hara;Y. Ikegami;N. Kuriyama;Y. Fujita;A. Takeda;S. Terada;J. Uchida;T. Tsuru;K. Koike;T. Sega;D. Nio;T. Kohriki;K. Shinsho;K. Hanagaki;I. Kurachi;M. Motoyoshi;N. Miura;Y. Ikemoto;H. Kasai;R. Ichimiya;Y. Arai;M. Kochiyama;Y. Horii;T. Tsuboyama;S. G. Ryu;K. Tauchi;M. Okihara;Y. Unno;T. Miyoshi;Y. Onuki

文献摘要

被引文献

相似文献

R. Ichimiya,Y. Ikegami,Y.池本,T. Kohriki,T. Miyoshi,K. Tauchi,S. Terada,T. Tsuboyma,Y. Unno,Y. Horii,Y. Onuki,D. Nio,A.武田,K. Hanagaki,J. Uchida,T.鹤隆岛Kurachi,H.加塞、N. Kuriyama,N. Miura,M. Okihara,M.日本筑波大学研究生院纯科学与应用科学研究科,茨木305-8571,日本B高能加速器研究机构,日本筑波,茨木305-0801 c东北大学理学研究生院,千叶区,仙台,宫城980-8578日本高等研究生院大学高能加速器科学系,筑波,茨木305-0801 e大坂大学理学研究生院,丰中区,大坂560-0043日本f理学研究生院京都大学,Sakyoku-ku,京都606-8502,日本g冲电气半导体公司,有限公司、日本东京八王子193-8550冲电气半导体宫城有限公司有限公司、Ohira,宫城981-3693,Japan i Tohoku-MicroTec Co.,Ltd.(T-Micro),Sendai,宫城980-8579,日本
R. Ichimiya, Y. Ikegami, Y. Ikemoto, T. Kohriki, T. Miyoshi, K. Tauchi, S. Terada, T. Tsuboyma, Y. Unno, Y. Horii, Y. Onuki, D. Nio, A. Takeda, K. Hanagaki, J. Uchida, T. Tsuru, S.G. Ryu, I. Kurachi, H. Kasai, N. Kuriyama, N. Miura, M. Okihara, M. Motoyoshi a Graduate School of Pure and Applied Sciences, Univ. of Tsukuba,Tsukuba, Ibaraki 305-8571, Japan b High Energy Accelerator Research Org.,Tsukuba, Ibaraki 305-0801, Japan c Graduate School of Science, Tohoku University, Aoba-ku, Sendai, Miyagi 980-8578, Japan The Graduate University for Advanced Studies, School of High Energy Accelerator Science, Tsukuba, Ibaraki 305-0801, Japan e Graduate School of Science, Osaka University, Toyonaka-ku, Osaka 560-0043, Japan f Graduate School of Science, Kyoto University, Sakyoku-ku, Kyoto 606-8502, Japan g OKI Semiconductor Co., Ltd., Hachioji, Tokyo 193-8550, Japan h OKI Semiconductor Miyagi Co., Ltd.,Ohira, Miyagi 981-3693, Japan i Tohoku-MicroTec Co., Ltd. (T-Micro), Sendai, Miyagi 980-8579, Japan