The influence of the ion current density on plasma nitriding process
The influence of the ion current density on plasma nitriding process
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DOI：
10.1016/j.surfcoat.2004.09.004
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发表时间：
2005-12
影响因子：
5.4
通讯作者：
E. Ochoa;C. Figueroa;F. Alvarez
中科院分区：
文献类型：
--
作者：
E. Ochoa;C. Figueroa;F. Alvarez
在本文中，我们报告了一个全面的氮化研究进行低合金钢AISI 4140，结合氮离子束（IB）注入和脉冲等离子体（PP）氮化。硬度，氮体积分布浓度，和电流离子密度之间的定量关系的报告。硬度曲线与氮浓度呈线性关系。采用光电子能谱（XPS）、X射线衍射（XRD）、扫描电镜（SEM）和纳米硬度测试等手段对样品进行了表征。经离子束注入处理的试样，其表面形成了主要由α-Fe_3 N和γ′-Fe_4 N组成的化合物层。而脉冲离子渗氮处理后的试样中只存在γ′-Fe 4 N相。在后一组样品中，可以证明硬度与离子电流密度成正比。
In this paper, we report a comprehensive nitriding study carried out using low-alloy steel AISI 4140, combining nitrogen ion-beam (IB) implantation and pulsed plasma (PP) nitriding. Quantitative relationships among hardness, nitrogen bulk profile concentration, and current ion densities are reported. The hardness profile showed a linear relationship with the nitrogen concentration. The samples were characterized by photoemission electron spectroscopy (XPS), X-rays diffraction analysis (XRD), scanning electron microscopy (SEM) and in-depth nanohardness measurements. Samples treated by ion-beam-implantation showed the presence of a compound layer formed principally by ɛ-Fe3N and γ′-Fe4N. On the other hand, samples treated by pulsed plasma nitriding showed only the existence of γ′-Fe4N. In the later set of samples, was possible to prove that hardness is proportional to the ion current density.