Application of confocal Raman spectroscopy to thin polymer layers on highly scattering substrates: a case study of synthetic adhesives on historic textiles
Application of confocal Raman spectroscopy to thin polymer layers on highly scattering substrates: a case study of synthetic adhesives on historic textiles
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共焦拉曼光谱在高散射基底上聚合物薄层上的应用：历史纺织品上合成粘合剂的案例研究
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发表时间：
2005
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影响因子：
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通讯作者：
P. Wyeth
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文献类型：
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作者：
A. Macdonald;A. Vaughan;P. Wyeth
本研究认为，共焦拉曼光谱的手段，确定一系列的合成聚合物粘合剂用于纺织品的保护。1970年代用于支撑易碎纺织品的许多合成粘合剂现在都显示出老化的迹象，因此这些纺织品正在进行再处理。
由于没有使用的粘合剂的记录，保护者不确定适当的协议，以消除原来的粘合剂之前retreatment.We已经表明，拉曼光谱本身的分析，这些薄的聚合物层，因为它本身是非破坏性的，可以应用于原位。我们还发现，对于特别薄的聚合物层（？20个？m）时，下面的纺织品通常比上面的聚合物更有效地散射，因此聚合物不能总是在原位被明确地识别。虽然已知厚的透明聚合物样品在激光聚焦在样品表面以下几微米处时产生最大拉曼峰强度，但是聚焦在或刚好在（0-5？m）显示聚合物层使聚合物峰强度与纺织品基底峰强度的比率最大化，从而便于识别聚合物。离焦进一步到20度？显示出在上表面上方的M重新引入来自基底光谱的干扰，其水平与在更靠近纺织品基底的薄聚合物层内聚焦时获得的水平相当。
This study considers confocal Raman spectroscopy as ameans of identifying a range of synthetic polymeric adhesives used in textile conservation. Many of the synthetic adhesives applied to support fragile textiles in the 1970s are now showing signs of ageing and the textiles are therefore being presented for retreatment.
With no record of the adhesive used, conservators are unsure of the appropriate protocol to remove the original adhesive prior to retreatment.We have shown that Raman spectroscopy lends itself to the analysis of these thin polymer layers as it is inherently non-destructive and can be applied in situ. We also found that, for particularly thin polymer layers (?20 ?m), the underlying textile often scatters farmore efficiently than the overlying polymer and therefore the polymer cannot always be identified unambiguously in situ. Although thick, transparent polymer samples are known to produce maximum Raman peak intensity when the laser is focused a few microns below the sample surface, focusing on or just above (0–5 ?m) the polymer layer is shown to maximize the ratio of polymer peak intensity to textile substrate peak intensity, thus facilitating identification of the polymer. Defocusing further to a point 20 ?mabove the upper surface is shown to reintroduce interference from the substrate spectrum to a level comparable to that acquired when focused within the thin polymer layer, closer to the textile substrate.