Reactive rearrangements of step atoms by adsorption and asymmetric electronic states of tetrafluoro-tetracyanoquinodimethane on Cu(100)
Reactive rearrangements of step atoms by adsorption and asymmetric electronic states of tetrafluoro-tetracyanoquinodimethane on Cu(100)
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DOI：
10.1103/physrevb.83.153403
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发表时间：
2011-04-06
影响因子：
3.7
通讯作者：
Yoshinobu, Jun
中科院分区：
文献类型：
--
作者：
Katayama, Tetsuo;Mukai, Kozo;Yoshinobu, Jun
利用扫描隧道显微镜（STM）和扫描隧道光谱（STS）研究了2，3，5，6-四氟-7，7，8，8-四氰基醌二甲烷（F4-TCNQ）在低覆盖度Cu（100）表面的局域吸附结构和电子态. F4-TCNQ分子，这是优先吸附在一个较低的台阶边缘，诱导反应重排的铜原子，包括形成周期性扭结和阶梯蚀刻。吸附在台阶边缘的F4-TCNQ的氰基不仅与Cu（100）平台相互作用，而且与上台阶边缘的Cu原子相互作用。这种额外的相互作用导致了F4-TCNQ物种的不对称电子态，STM和STS证明了这一点。
We investigated the local adsorption structure and electronic states of 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4-TCNQ) on Cu(100) at low coverage using scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). F4-TCNQ molecules, which are preferentially adsorbed at a lower step edge, induce the reactive rearrangements of Cu atoms, including the formation of periodic kinks and step etching. The cyano groups of F4-TCNQ adsorbed at the step edge interact with not only the Cu(100) terrace but also Cu atoms at an upper step edge. This extra interaction results in the asymmetric electronic states in F4-TCNQ species, which are evidenced by STM and STS.