Fabrication of surface relief gratings on azo dye thin films utilizing an interference of evanescent waves
Fabrication of surface relief gratings on azo dye thin films utilizing an interference of evanescent waves
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DOI：
10.1063/1.1857070
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发表时间：
2005-01
影响因子：
4
通讯作者：
Y. Ohdaira;S. Hoshiyama;T. Kawakami;K. Shinbo;K. Kato;F. Kaneko
中科院分区：
文献类型：
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作者：
Y. Ohdaira;S. Hoshiyama;T. Kawakami;K. Shinbo;K. Kato;F. Kaneko
研究了利用倏逝波干涉在偶氮染料薄膜上制备表面起伏光栅的方法。在光异构化偶氮染料薄膜上刻划了约210 nm的srg，其波长小于入射激光的一半波长（488.0 nm）。薄膜被设置在直角三角形棱镜表面，在棱镜表面受到全反射激光束倏逝波的干涉。表面的干涉是用激光束穿过等腰的一侧，并在等腰的另一侧设置镜子的地方返回光束。利用原子力显微镜在棱镜表面上方原位观察了偶氮染料薄膜由于染料的顺式跃迁而形成的SRG模式。
Fabrication of surface relief gratings (SRGs) on azo dye thin films has been investigated utilizing an interference of evanescent waves. SRGs of approximately 210 nm were inscribed on the photoisomerized azo dye films, that were smaller than a half wavelength of an incidence laser of 488.0 nm. The films were set on a right-angled triangular prism surface and were in the interference of evanescent waves of totally reflected laser beams at the prism surface. The interference at the surface was performed using a laser beam through the one side of the isosceles and the returned beam at the other side of the isosceles where a mirror was set. The SRG patterns of azo dye films due to trans–cis transition of the dyes were observed in situ using an atomic force microscope above the prism surface.