In Situ Real-Time X-Ray Diffraction During Thin Film Growth of Pentacene

In Situ Real-Time X-Ray Diffraction During Thin Film Growth of Pentacene
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DOI:
10.1080/15421406.2012.701111
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发表时间:
2012-09
影响因子:
0.7
通讯作者:
T. Watanabe;T. Hosokai;T. Koganezawa;N. Yoshimoto
T. Watanabe;T. Hosokai;T. Koganezawa;N. Yoshimoto
中科院分区:
化学4区
文献类型:
--
作者:
T. Watanabe;T. Hosokai;T. Koganezawa;N. Yoshimoto

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利用自行研制的便携式真空沉积室,在SPring-8上对并五苯薄膜生长过程中的二维掠入射X射线衍射(2D-GIXD)进行了原位和实时观测。在室温和75°C下,清晰地观察到晶体生长和从薄膜相到体相的连续多晶型转变。在室温下生长的薄膜中发现了明显的体相取向,其特征是倾斜的(001)面。
In situ and real-time observation of 2-dimensional grazing incidence x-ray diffraction (2D-GIXD) during growth of pentacene thin films were carried out using a newly home-built portable vacuum deposition chamber using synchrotron radiation at SPring-8. Crystal growth and successive polymorphic transformation from thin film phase to bulk phase are clearly observed at room temperature and 75°C. A distinct orientation of bulk phase characterized by tilted (001) plane is found in the grown thin films at room temperature.