Low energy Fe+ beam irradiation to C60 thin film.

Low energy Fe+ beam irradiation to C60 thin film.
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低能Fe束照射C60薄膜。

DOI:
10.1063/1.3675456
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发表时间:
2012
期刊:
The Review of scientific instruments
影响因子:
--
通讯作者:
Yoshikazu Yoshida
Yoshikazu Yoshida
中科院分区:
--
文献类型:
--
作者:
H. Minezaki;K. Oshima;Takashi Uchida;M. Muramatsu;T. Asaji;Atsushi Kitagawa;Y. Kato;S. Biri;Yoshikazu Yoshida

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我们研制了一台电子回旋共振离子源装置,它是专为生产内嵌富勒烯而设计的。在本研究中,我们用Fe(+)离子束照射C(60)薄膜。我们改变了剂量和离子能量的实验条件。通过飞行时间质谱分析,我们可以观察到Fe + C(60)峰。Fe + C(60)峰的最高强度在离子能量为200 eV时观察到。Fe + C(60)峰强度随辐照时间的延长和剂量的增大而增大。
We have developed an electron cyclotron resonance ion source apparatus, which is designed for the production of endohedral fullerene. In this study, we irradiated the Fe(+) beam to the C(60) thin film. We changed the experimental condition of the dose and the ion energy. We could observe the Fe + C(60) peak by analysis of the time-of-flight mass spectrometry. The highest intensity of the Fe + C(60) peak was observed at the ion energy of 200 eV. The Fe + C(60) peak intensity tended to become high in the case of long irradiation time and large dose.