Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses
Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses
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DOI：
10.1364/ol.24.001311
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发表时间：
1999-09-15
期刊：
影响因子：
3.6
通讯作者：
Smith, C
中科院分区：
文献类型：
--
作者：
Homoelle, D;Wielandy, S;Smith, C
我们研究了利用红外飞秒激光脉冲诱导熔融石英玻璃的高度局部折射率变化。我们将变化的幅度描述为暴露的函数，并测量了纯熔融二氧化硅和掺硼二氧化硅的指数变化分别为3 × 10（-3）和5 × 10（-3）。通过在纯熔融二氧化硅样品中制作Y耦合器，证明了这种技术在块状玻璃中书写三维光子结构的潜力。(C) 1999年美国光学学会OCIS编码：320.7130,190.4180,230.4000,230.7370,160.2750。
We investigate the use of infrared femtosecond laser pulses to induce highly localized refractive-index changes in fused-silica glasses. We characterize the magnitude of the change as a function of exposure and measure index changes as large as 3 x 10(-3) and 5 x 10(-3) in pure fused silica and boron-doped silica, respectively. The potential of this technique for writing three-dimensional photonic structures in bulk glasses is demonstrated by the fabrication of a Y coupler within a sample of pure fused silica. (C) 1999 Optical Society of America OCIS codes: 320.7130, 190.4180, 230.4000, 230.7370, 160.2750.