An in situ system for simultaneous stress measurement and optical observation of silicon thin film electrodes
An in situ system for simultaneous stress measurement and optical observation of silicon thin film electrodes
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硅薄膜电极同时应力测量和光学观察的原位系统
DOI：
10.1016/j.jpowsour.2019.227227
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发表时间：
2019-12-31
影响因子：
9.2
通讯作者：
Fang, Dai-Ning
中科院分区：
文献类型：
--
作者：
Chen, Jian;Yang, Le;Fang, Dai-Ning
在这里，提出了一个原位系统，同时研究在硅薄膜电极的形态和应力的演变过程中锂化和脱锂。由于在原位电池中具有两个观察窗口的特定设计，可以通过多光学传感器和光学显微镜测量锂化和脱锂过程中硅薄膜电极的曲率和颜色。通过这种比色方法，可以用颜色的演变来表征硅薄膜电极的厚度，并通过原位原子力显微镜和光学显微镜实验得到定量关系。将真实的厚度与Stoney方程相结合，可以得到LixSi薄膜在电化学循环过程中的精确应力。
Here an in situ system is presented to simultaneously study the evolution of both morphology and stress in the silicon thin film electrode during lithiation and delithiation. Owing to the specific design with two observation windows in the in situ cell, both the curvature and color of the silicon thin-film electrodes upon lithiation and delithiation processes can be measured by multi-optical sensor and optical microscope. By such colorimetric method, the color evolution can be used to represent the thickness of silicon thin film electrode, and the quantitative relationship can be obtained by in situ atomic force microscope and optical microscopy experiments. Combining the real thickness with Stoney equation, the accurate stress of the LixSi film can be obtained during the electrochemical cycles.