A photoelectrochemical investigation of conversion coatings on Mg substrates
A photoelectrochemical investigation of conversion coatings on Mg substrates
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DOI：
10.1016/j.corsci.2005.05.033
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发表时间：
2005-12-01
影响因子：
8.3
通讯作者：
Di Quarto, F
中科院分区：
文献类型：
--
作者：
Anicai, L;Masi, R;Di Quarto, F
采用电位时间、极化曲线、x射线衍射、扫描电镜和光电流谱等方法研究了锡酸盐镀液中纯Mg转化涂层的结构、形貌和组成。涂层主要由结晶型氢氧化镁锡组成，其形态和分布与转化液成分和温度有关。光电化学研究可以估计MgSn(OH)(6)的带隙值和平带电位。据报道，在金属衬底上转换过程中形成的金属/钝化膜/电解质结的草图可以解释整个光电化学行为。(c) 2005 Elsevier Ltd版权所有。
The structure, morphology and composition of conversion coatings grown in stannate bath on pure Mg were studied using potential-time, polarization curves, X-ray diffraction, scanning electron microscopy and photocurrent spectroscopy. The coating is manly constituted by crystalline magnesium-tin hydroxide, whose morphology and distribution depends on the conversion bath composition and temperature. The photoelectrochemical investigation allowed to estimate the band gap value of MgSn(OH)(6) and flat band potential. A sketch of the metal/passive film/electrolyte junction formed during conversion on the metal substrate is reported to account for the overall photoelectrochemical behaviour. (c) 2005 Elsevier Ltd. All rights reserved.