Physical properties of very thin SnS films deposited by thermal evaporation
Physical properties of very thin SnS films deposited by thermal evaporation
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热蒸发沉积的极薄 SnS 薄膜的物理特性
DOI:
10.1016/j.tsf.2011.01.355
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发表时间:
2011-11-01
期刊:
影响因子:
2.1
通讯作者:
Conibeer, Gavin
中科院分区:
文献类型:
--
作者:
Cheng, Shuying;Conibeer, Gavin
SnS films with thicknesses of 20-65 nm have been deposited on glass substrates by thermal evaporation. The physical properties of the films were investigated using X-ray diffraction (XRD), scanning electron microscopy, X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and ultraviolet-visible-near infrared spectroscopy at room temperature. The results from XRD, XPS and Raman spectroscopy analyses indicate that the deposited films mainly exhibit SnS phase, but they may contain a tiny amount of Sn2S3. The deposited SnS films are pinhole free, smooth and strongly adherent to the surfaces of the substrates. The color of the SnS films changes from pale yellow to brown with the increase of the film thickness from 20 nm to 65 nm. The very smooth surfaces of the thin films result in their high reflectance. The direct bandgap of the films is between 2.15 eV and 2.28 eV which is much larger than 1.3 eV of bulk SnS, this is deserving to be investigated further. (C) 2011 Elsevier B.V. All rights reserved.