PHOTODECOMPOSABLE BASES: A NOVEL CONCEPT TO STABILIZE CHEMICALLY AMPLIFIED RESISTS
PHOTODECOMPOSABLE BASES: A NOVEL CONCEPT TO STABILIZE CHEMICALLY AMPLIFIED RESISTS
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光分解碱：稳定化学增强抗蚀剂的新概念
DOI：
10.2494/photopolymer.8.543
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发表时间：
1995
影响因子：
0.8
通讯作者：
G. Pawlowski
中科院分区：
文献类型：
--
作者：
S. Funato;Y. Kinoshita;T. Kudo;S. Masuda;H. Okazaki;M. Padmanaban;K. Przybilla;N. Suehiro;G. Pawlowski
标准的正性化学放大抗蚀剂通常在其曝光后遭受由不受控制的酸扩散引起的潜像不稳定性。为了提高延迟稳定性，开发了具有高亲核性和辐射灵敏度的新型抗蚀剂添加剂。典型的代表包括鸦片氢氧化物、醇盐或羧酸盐，它们在水介质中作为强碱。这些化合物在暴露后分解成中性碎片，但在未暴露的区域保持其基本特征。这使得能够选择性地中和预期未暴露区域中的扩散酸。当应用于化学放大抗蚀剂系统时，抗蚀剂溶液的保存期、膜寿命稳定性和延迟时间稳定性显著提高，而感光速度仅略微劣化。增强的分辨率能力和改进的纬度是额外的好处。
Standard positive tone chemically amplified resists usually suffer from a latent image instability caused by uncontrolled acid diffusion after their exposure. To improve the delay stability, novel resist additives with both high nucleophilicity and radiation sensitivity have been developed. Typical representatives include opium hydroxides, alkoxides, or carboxylates, which act as strong bases in aqueous media. The compounds decompose into neutral fragments upon exposure but preserve their basic character in the unexposed areas. This enables a selective neutralization of the diffusing acid in areas of intended unexposure. When applied to a chemically amplified resist system the shelf life of the resist solution, the film life stability and the delay time stability are significantly improved, while the photospeed is only marginally deteriorated. Enhanced resolution capability, and improved latitudes are additional benefits.