Thermo- and Photo-sensitive GeO2–B2O3–SiO2 Thin Glass Films
Thermo- and Photo-sensitive GeO2–B2O3–SiO2 Thin Glass Films
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热敏和光敏 GeO2–B2O3–SiO2 玻璃薄膜
DOI：
10.1143/jjap.42.559
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发表时间：
2003
影响因子：
1.5
通讯作者：
I. Miyamoto
中科院分区：
文献类型：
--
作者：
Hiroaki Nishiyama;K. Kintaka;J. Nishii;T. Sano;E. Ohmura;I. Miyamoto
采用等离子体增强化学气相沉积法制备了具有良好热敏性和光敏性的GeO 2-B2 O3-SiO2薄膜。用KrF准分子激光通过相位掩模在没有H2负载的情况下在薄膜中形成具有高衍射效率的布拉格光栅。衍射效率在500°C退火后迅速下降，但在600°C退火后显著提高。这种增加与紫外波长区域强吸收带的形成密切相关。在退火之前通过激光照射抑制热诱导折射率变化的生长。因此，衍射效率显著提高的原因被认为是形成了另一种具有相反折射率图案的光栅。这种热稳定的光栅在室温和600°C之间的重复热处理中从未被擦除。
GeO2–B2O3–SiO2 thin films having excellent thermo- and photo-sensitivity were fabricated by the plasma enhanced chemical vapor deposition method. Bragg gratings with high diffraction efficiency were formed in the films by irradiation with a KrF excimer laser through the phase mask without H2 loading. The diffraction efficiency decreased rapidly by the annealing up to 500°C, but increased significantly at 600°C. Such an increase was closely related to the formation of intense absorption bands in the ultraviolet wavelength region. The growth of the thermo-induced index change was suppressed by the laser irradiation prior to the annealing. Thus the origin of the marked increase in diffraction efficiency was considered to be the formation of another type of grating with the reverse index pattern. This thermally stabilized grating was never erased by the repeated heat treatment between room temperature and 600°C.