Integrated Assembly and Photopreservation of Topographical Micropatterns (Small 37/2021)
Integrated Assembly and Photopreservation of Topographical Micropatterns (Small 37/2021)
复制标题
形貌微图案的集成组装和光保存(小 37/2021)
作者:
Zhang S
In article number 2103702, Aaron R. Wheeler and co-workers introduce a new technique for forming permanent topographical micropatterns, relying on optoelectronic tweezers (OET) and in situ UV photopolymerization. For the first time, an OET system was used to assemble working microcapacitive circuits, and the capacity to preserve these systems in photocured resins (which can be transferred to diverse materials) opens the door for a wide range of applications.