Design of a compact waveguide optical isolator based on multimode interferometers using magneto-optical oxide thin films grown on silicon-on-insulator substrates.
Design of a compact waveguide optical isolator based on multimode interferometers using magneto-optical oxide thin films grown on silicon-on-insulator substrates.
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DOI：
10.1364/oe.24.012856
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发表时间：
2016-06
期刊：
影响因子：
3.8
通讯作者：
Keyi Shui;Lixia Nie;Yan Zhang;Bo Peng;Jianliang Xie;L. Deng;L. Bi
中科院分区：
文献类型：
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作者：
Keyi Shui;Lixia Nie;Yan Zhang;Bo Peng;Jianliang Xie;L. Deng;L. Bi
本文报道了一种基于多模干涉仪（MMI）结构的波导光隔离器的设计，该结构采用绝缘体上硅（SOI）和沉积磁光（MO）薄膜。该光隔离器基于一个垂直的1 × 2 SOI MMI，利用MO石榴石薄膜/SOI波导不同TM模式的非互反相移（NRPS）差异。通过构建硅/MO薄膜/硅结构，我们证明了基阶和一阶TM模式的NRPS在某些器件尺寸上可以呈现相反的符号，从而显着减小器件长度。对于长310.42 μm的器件，在1550 nm波长处可实现大于1.6 nm的20db隔离带宽，总插入损耗为0.817 dB。为了满足最新的制造技术和材料性能，还讨论了制造公差和材料损耗。
We report the design of a waveguide optical isolator based on multimode interferometer (MMI) structure using silicon on insulator (SOI) and deposited magneto-optical (MO) thin films. The optical isolator is based on a vertical 1 × 2 SOI MMI utilizing the nonreciprocal phase shift (NRPS) difference of different TM modes of the MO garnet thin film/SOI waveguide. By constructing a silicon/MO thin film/silicon structure, we demonstrate that the NRPS of the fundamental and first order TM modes can show opposite signs for certain device dimensions, therefore significantly reduce the device length. For a 310.42 μm long device, 20 dB isolation bandwidth larger than 1.6 nm with total insertion loss of 0.817 dB is achieved at 1550 nm wavelength. The fabrication tolerances and materials losses are also discussed to satisfy the state-of-the-art fabrication technology and material properties.