Toward Tungsten Electrodeposition at Moderate Temperatures Below 100°C Using Chloroaluminate Ionic Liquids
Toward Tungsten Electrodeposition at Moderate Temperatures Below 100°C Using Chloroaluminate Ionic Liquids
复制标题
使用氯铝酸盐离子液体在低于 100°C 的中等温度下进行钨电沉积
DOI：
10.1149/1945-7111/accfc4
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发表时间：
2023
影响因子：
3.9
通讯作者：
Hirato Tetsuji
中科院分区：
文献类型：
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作者：
Higashino Shota;Takeuchi Yoshikazu;Miyake Masao;Sakai Takuma;Ikenoue Takumi;Tane Masakazu;Hirato Tetsuji
在中等温度（< 100 C）下电沉积钨对于薄膜和微机电系统组件的制造具有重要意义，可以降低能耗并提高工艺安全性。在这项研究中，我们研究了WCl 4 和WCl 5 在1-乙基-3-甲基咪唑氯化物（EMIC）和EMIC-AlCl 3 离子液体中在80 C-120 C下的电化学还原。从Lewis酸性EMIC-AlCl 3-WCl 5 浴中获得了厚度约为1 μm的富W薄膜，而其他浴没有产生任何沉积物。在80℃下从EMIC-AlCl 3-WCl 5 浴中获得的薄膜比在120℃下获得的薄膜具有更高的54at.%的W含量。富W薄膜的X射线吸收近边结构光谱表明W以氧化态存在。这项研究的结果可以作为探索中等温度下金属钨电沉积的最佳电解质和电解条件的指南。
The electrodeposition of tungsten at moderate temperatures (< 100 C) has been of significant interest for the fabrication of thin films and microelectromechanical system components to decrease energy consumption and increase process safety. In this study, we investigated the electrochemical reduction of WCl 4 and WCl 5 in 1-ethyl-3-methylimidazolium chloride (EMIC) and EMIC–AlCl 3 ionic liquids at 80 C–120 C. W-rich films with a thickness of approximately 1 μm were obtained from the Lewis acidic EMIC–AlCl 3–WCl 5 bath, whereas the other baths did not yield any deposits. The films obtained from the EMIC–AlCl 3–WCl 5 bath at 80 C had higher W contents of 54 at.% than those obtained at 120 C. X-ray absorption near-edge structure spectra of the W-rich films indicated that W existed in an oxidized state. The findings of this study can be used as a guide to explore optimal electrolytes and electrolytic conditions for the electrodeposition of metallic W at moderate temperatures.