Production of stable tellurium evaporated targets
Production of stable tellurium evaporated targets
复制标题
稳定碲蒸发靶材的生产
DOI：
10.1016/j.nima.2008.02.082
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发表时间：
2008
期刊：
影响因子：
--
通讯作者：
M. Wiescher
中科院分区：
文献类型：
--
作者：
J. Greene;A. Palumbo;W. Tan;J. Görres;M. Wiescher
由于Te金属的低熔点，自支撑Te靶在粒子束照射下迅速退化。如果碲材料被蒸发到C箔衬底上，这种情况会得到极大的改善。靶层和衬底中的弹性散射使Te峰变宽，使测量变得困难，而太少的材料会降低反应速度。因此，有必要对靶材厚度进行优化。蒸发金属和氧化物Te靶是在Argonne国家实验室用电阻加热源船真空沉积制备的。然后，使用圣母大学的FN串列范德格拉夫加速器，将目标暴露在能量范围从17到27 MeV的不同强度的阿尔法束中，以测试目标的稳定性。然后获得了用于p工艺实验的最佳靶厚和束流。将介绍该设备和生产方法。
Due to the low melting point of tellurium metal, self-supporting Te targets degrade quickly when exposed to particle beams. This situation is greatly improved if the tellurium material is evaporated onto C foil backings. Elastic scattering in target and backing layers broadens the Te peak, making measurements difficult, while too little material reduces the reaction rate. Therefore, it is necessary to optimize the target thickness. Evaporated metallic and oxide Te targets were prepared at Argonne National Laboratory by vacuum deposition from a resistively heated source boat. The stability of the targets was then tested by exposing them to a varying intensity alpha beam with an energy range from 17 to 27MeV using the FN Tandem Van de Graaff accelerator at the University of Notre Dame. Optimal target thicknesses and beam currents were then obtained for p-process experiments. A description of the apparatus and production method will be presented.