Dependences of deposition rate and OH content on concentration of added trichloroethylene in low-temperature silicon oxide films deposited using silicone oil and ozone gas
Dependences of deposition rate and OH content on concentration of added trichloroethylene in low-temperature silicon oxide films deposited using silicone oil and ozone gas
复制标题
使用硅油和臭氧气体沉积的低温氧化硅薄膜中沉积速率和 OH 含量对添加三氯乙烯浓度的依赖性
DOI：
10.7567/jjap.57.03da02
复制
发表时间：
2018
影响因子：
1.5
通讯作者：
Susumu Horita and Puneet Jain
中科院分区：
文献类型：
--
作者：
Maruoka Kenji;Naito Taiki;Maida Osamu;Ito Toshimichi;Susumu Horita and Puneet Jain
