Atomic layer deposition of functional multicomponent oxides
Atomic layer deposition of functional multicomponent oxides
复制标题
DOI：
10.1063/1.5113656
复制
发表时间：
2019-11-01
期刊：
影响因子：
6.1
通讯作者：
Napari, Mari
中科院分区：
文献类型：
--
作者：
Coll, Mariona;Napari, Mari
多组分氧化物薄膜制备技术的发展对制备具有精确结构和可控界面的特定组分的氧化物薄膜至关重要。这将使新现象的研究和新设备和应用的开发成为可能。原子层沉积（ALD）在过去几十年中在具有原子尺度控制的共形薄膜和纳米结构的制造中蓬勃发展。尽管如此，沉积具有所需性质的复合氧化物的情况已被证明是具有挑战性的。在这篇文章中，我们仔细研究了ALD的前体和工艺设计的基础知识，然后回顾了掺杂和复合氧化物合成的主要成就，确定了几个相关的例子，预见到有直接的技术应用。最后，ALD复合氧化物目前面临的挑战和前景。(C)2019年作者。
Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces. This will enable the investigation of novel phenomena and development of new devices and applications. Atomic layer deposition (ALD) has flourished over the last decades in fabrication of conformal thin films and nanostructures with atomic-scale control. Nonetheless, the scenario of deposition of complex oxides with desired properties has proven to be challenging. In this article, we scrutinize the basics of the precursor and process design for ALD followed by a review on the major achievements in the synthesis of doped and complex oxides identifying several relevant examples that are foreseen to have direct technological applications. Finally, current challenges and perspectives on ALD complex oxides are given. (C) 2019 Author(s).