Determination of the indium content and layer thicknesses in InGaN/GaN quantum wells by x-ray scattering
Determination of the indium content and layer thicknesses in InGaN/GaN quantum wells by x-ray scattering
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DOI:
10.1063/1.1587251
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发表时间:
2003-07
影响因子:
3.2
通讯作者:
M. E. Vickers;M. Kappers;T. Smeeton;E. Thrush;J. Barnard;C. Humphreys
中科院分区:
文献类型:
--
作者:
M. E. Vickers;M. Kappers;T. Smeeton;E. Thrush;J. Barnard;C. Humphreys
We have determined the indium content and the layer thicknesses in an InGaN epilayer and InGaN/GaN quantum well structures by high-resolution x-ray diffraction (XRD) using the (002) reflection. The thickness of the total repeat (an InGaN well plus a GaN barrier) in the superlattice is easily determined from the spacing between the satellite peaks in an omega/2theta scan. Measurement of the individual thickness of InGaN and GaN layers and the indium content is less straightforward, since for multilayer structures the peak positions are influenced by both the indium content and the thickness ratio of the GaN to the InGaN layer. Thus, several different models may give reasonable fits to data collected over a limited range (about 1° omega/2theta either side of the (002)) showing only lower-order (−3 to +3) satellite peaks. Whenever possible, we have collected data over a wide range (about 4° omega/2theta) and determined the thickness ratio by examination of the relative intensities of weak higher-order satell...