Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography
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DOI：
10.1063/1.4837335
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发表时间：
2013-11-25
影响因子：
4
通讯作者：
Bijkerk, F.
中科院分区：
文献类型：
--
作者：
Medvedev, V. V.;van de Kruijs, R. W. E.;Bijkerk, F.
我们已经证明了一种混合极紫外（EUV）多层反射镜为6.x nm的辐射，提供了选择性抑制红外（IR）辐射。该镜由一个IR透明的LaN/B多层堆叠，它被用作EUV反射涂层和抗反射（AR）涂层，以抑制IR。AR涂层可以被优化，以抑制在10.6 μ m的波长的CO2激光辐射，这是感兴趣的应用在下一代EUV光刻系统。(C)2013 AIP Publishing LLC.
We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN/B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 mu m, which is of interest for application in next-generation EUV lithography systems. (C) 2013 AIP Publishing LLC.