Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates
Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates
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DOI：
10.1063/5.0157164
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发表时间：
2023-10
影响因子：
3.2
通讯作者：
Mingming Yan;Tianchong Zhang;Bo Wang;Jing Liu;Xiaoxiao Liang;Yuanze Xu;F. Yi
中科院分区：
文献类型：
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作者：
Mingming Yan;Tianchong Zhang;Bo Wang;Jing Liu;Xiaoxiao Liang;Yuanze Xu;F. Yi
原子层沉积是制备大面积均匀、三维共形和超薄膜的关键技术，因为它具有连续的自限饱和化学吸附特性。在铂等离子体增强原子层沉积过程中，在Si、Al_2O_3、Au和Ni衬底上施加了不同大小和方向的电场。研究电场对不同衬底上铂薄膜初始成核和生长的影响，有助于了解其动力学知识和潜在的物理机制，从而获得超薄、连续的薄膜，并完全控制沉积材料的形貌和分布。XPS结果表明，随着外加电压的增加，铂在所有衬底上的覆盖率都增加了。诱导偶极矩使(MeCp)PtMe3分子沿一定方向旋转，形成更紧密的排列，电场产生的能量也有助于甲基、乙基、Cp和MeCp配体的解离，大大缓解了空间位电阻效应，从而提高了初始单分子层的化学吸附效率和铂的覆盖率。我们还发现，由于电场作用下的梯度力增加了(MeCp)PtMe3分子的吸附，所以铂倾向于沿(111)方向生长。然而，外加电场也可以通过诱导表面扩散和作用于等离子体物种来影响形貌。
Atomic layer deposition is a key technique for preparing large area uniformity, three-dimensional conformal, and ultrathin films due to its sequential self-limiting saturated chemisorption properties. Electric fields of varying magnitudes and directions were applied on Si, Al2O3, Au, and Ni substrates in Pt plasma enhanced atomic layer deposition processes. Studying the influences of electric fields on the initial nucleation and growth of Pt films on different substrates helps to understand the dynamic knowledge and underlying physical mechanisms so as to obtain ultrathin, continuous films and full control over the morphology and distribution of deposited materials. The XPS results reveal that the Pt coverage rate increases on all substrates with applied voltages. The induced dipole moment causes the (MeCp)PtMe3 molecule to rotate in a certain direction resulting in a more compact arrangement, and the energy generated by electric fields also helps the dissociation of methyl, ethyl, Cp, and MeCp ligands, which greatly mitigate the spatial site resistance effect, thus improving initial monolayer chemisorption efficiency and the Pt coverage. We also find that Pt prefers to grow in the (111) direction due to the increase in adsorption of (MeCp)PtMe3 molecules caused by the gradient forces under electric fields. However, applied electric fields can also influence the morphology by inducing surface diffusion and acting on plasma species.