Deposition and qualification of tungsten coatings produced by plasma deposition in WF6 precursor gas
Deposition and qualification of tungsten coatings produced by plasma deposition in WF6 precursor gas
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WF6 前体气体中等离子沉积钨涂层的沉积和鉴定
DOI：
10.1088/0031-8949/2011/t145/014030
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发表时间：
2011
期刊：
影响因子：
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通讯作者：
A. Sanyasi
中科院分区：
文献类型：
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作者：
V. Philipps;D. Kogut;H. Esser;G. Sergienko;M. Zlobinski;J. Coenen;S. Brezinsek;F. Nachtrodt;A. Sanyasi
目前正在进行一项强有力的研发计划，以使钨有资格作为ITER和未来可能的设备中的面向等离子体的材料。由于使用实心钨砖会带来许多问题，主要是增加的力、重量和成本，因此通常使用石墨墙砖上的钨涂层。这些涂层在特殊的沉积设备中沉积，而原位等离子体辅助技术广泛用于低Z壁涂层，例如碳化、硼化或硅化。为了开发一个类似的程序，用于在等离子体面对材料的原位涂层与钨，沉积技术的基础上的混合物的95%H2和5%WF6进行了分析。在实验室实验中已沉积了厚度达0.5 μm的钨涂层，并通过多种方法对涂层进行了表征。沉积在细颗粒石墨上的W涂层具有致密的结构和粗糙的表面，并且不含氟。该涂层具有优异的耐高热通量性能，在高达600-700 MW m−2的瞬态热通量测试中，在1 ms内没有失效。
A strong R&D programme is at present ongoing to qualify tungsten as the plasma-facing material in ITER and possible future devices. Since the use of solid W tiles poses a number of problems, mainly with respect to increased forces, weight and costs, W coatings on graphite wall tiles are often used instead. These coatings are deposited in a special deposition apparatus, while in situ plasma-assisted techniques are widely used for low-Z wall coatings such as, for example, in carbonization, boronization or siliconization. To develop a similar procedure for the in situ coating of plasma-facing materials with tungsten, a deposition technique based on a mixture of 95% H2 and 5% WF6 was analysed. Tungsten coatings up to 0.5 μm have been deposited in laboratory experiments and the coatings were characterized by a number of methods. The W coatings deposited on fine-grain graphite have a dense structure with a rough surface and are free of fluorine. The coatings show excellent high-heat-flux resistance with no failures in transient heat flux tests up to 600–700 MW m−2 for 1 ms.