Ferroelectric PbTiO3 Thin Films Prepared by Multi-Ion-Beam Sputter and Ion-Assisted Deposition
Ferroelectric PbTiO3 Thin Films Prepared by Multi-Ion-Beam Sputter and Ion-Assisted Deposition
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多离子束溅射和离子辅助沉积制备铁电PbTiO3薄膜
DOI：
10.1143/jjap.32.l950
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发表时间：
1993
影响因子：
1.5
通讯作者：
Takashi Hirao Takashi Hirao
中科院分区：
文献类型：
--
作者：
I. Kanno;T. Kamada;S. Hayashi;Masatoshi Kitagawa Masatoshi Kitagawa;Takashi Hirao Takashi Hirao
采用多离子束溅射沉积法在MgO衬底上原位合成了厚度为350 nm的PbTiO3薄膜。在415°C的低衬底温度下通过在氧气环境中的反应溅射获得钙钛矿相的结晶膜。作为沉积参数的函数的晶相的形成进行了研究，并使用电子回旋共振（ECR）等离子体的离子束辅助沉积也被用来改善膜的生长。低能量（<300 eV）氧离子轰击被发现在400°C的较低衬底温度下增强c轴取向和结晶。
Very thin PbTiO3 films of ∼350 Å were synthesized in situ on MgO substrates by multi-ion-beam sputter deposition using metal targets. Crystalline films in a perovskite phase were obtained at a low substrate temperature of 415°C by means of reactive sputtering in an oxygen ambient. The formation of crystal phases was studied as a function of deposition parameters, and ion-beam-assisted deposition using an electron cyclotron resonance (ECR) plasma was also employed to improve the film growth. Low-energy (<300 eV) oxygen ion bombardment was found to enhance c-axis orientation and crystallization at a lower substrate temperature of 400°C.