Fabrication of the hierarchical structure photocathode by structuring the surface nanopores on Si nanowires standing on p-Si wafer for the effective photoelectrochemical reduction of Cr(VI) in the aqueous solution
Fabrication of the hierarchical structure photocathode by structuring the surface nanopores on Si nanowires standing on p-Si wafer for the effective photoelectrochemical reduction of Cr(VI) in the aqueous solution
复制标题
通过在 p-Si 晶片上的 Si 纳米线上构造表面纳米孔来制造分级结构光电阴极,以有效光电化学还原水溶液中的 Cr(VI)
DOI:
10.1016/j.seppur.2016.10.031
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发表时间:
2017
影响因子:
8.6
通讯作者:
Chen Shuo
中科院分区:
文献类型:
--
作者:
Wu Shuai;Yu Hongtao;Lu Na;Quan Xie;Chen Shuo
Herein, we reported a method to inhibit the oxidation passivation of Si nanomaterials (taking Si nanowire array (SiNW, about 100 nm of diameter) as a representative) via structuring nanopores (less than 10 nm) on their surface. SiNW array was prepared through metal-assisted chemical etching. After 30 min of etching, nanopores were formed on the surface of SiNW and the amount of nanopores increased with the prolonging of the etching duration. Due to the generation of the nanopores, the decrease of optical reflection was observed. The photoelectrochemical performance of samples prepared after 30, 60 and 90 min etching were evaluated. The sample etched for 60 min displayed the highest and stable photocurrent and was used in the photoelectrocatalytic testing. The SiNW with nanopores exhibited significant photoelectrocatalytic stability than that of SiNW. The kinetic constant of Cr(VI) reduction over SiNW with nanopores was 0.081 min−1, which was 1.8 times as much as that over SiNW (0.045 cm−1) and maintained above 0.080 min−1after three repeated experimental runs. These results demonstrate that constructing surface nanopores on the surface of SiNW is an effective approach to realize the use of Si materials as photoelectrodes in the aqueous solution.