Synthesis of PECVD a-SiCXNY:H membranes as molecular sieves for small gas separation
Synthesis of PECVD a-SiCXNY:H membranes as molecular sieves for small gas separation
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DOI：
10.1016/j.memsci.2008.12.028
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发表时间：
2009-03-05
影响因子：
9.5
通讯作者：
Durand, Jean
中科院分区：
文献类型：
--
作者：
Kafrouni, Wassim;Rouessac, Vincent;Durand, Jean
研究了等离子体增强化学气相沉积(PECVD)a-SiCXNY：H薄膜作为分子筛膜在室温至150℃下对轻(氢、氦)气体的分离。用扫描电子显微镜、傅里叶变换红外光谱、能谱、热重分析和椭圆偏振光谱仪表征了沉积材料的微观结构和热稳定性随等离子体功率和蒸汽前驱体六甲基二硅氮烷与氨气的比例的变化。还进行了单一气体渗透试验。在150℃下，氦对氮的理想选择性为50，氦的渗透率约为10(-7)molm(-2)S(-1)pa-1。这些有望用于气体分离的PECVD材料还显示出高达500摄氏度的化学稳定性，即使在氧化气氛中也是如此。(C)2008爱思唯尔B.V.保留所有权利。
Plasma enhanced chemical vapor deposition (PECVD) a-SiCXNY:H thin films have been studied as molecular sieve membranes for light (hydrogen, helium) gas separation at room temperature up to 150 degrees C. The microstructure of the deposited materials and their thermal stability have been characterized as a function of the electric plasma power and the ratio between the vapor precursors - hexamethyldisilazane and ammonia - using SEM, Fourier transformed infrared spectroscopy (FTIR), EDS, thermo-gravimetric analysis (TGA) and ellipsometry. Single gas permeation tests have also been carried out. An ideal selectivity of helium over nitrogen of 50 has been obtained at 150 degrees C with a helium permeance of about 10(-7) mol m(-2) s(-1) Pa-1. These promising PECVD materials developed for gas separation also revealed a chemical stability up to 500 degrees C, even in oxidative atmosphere. (c) 2008 Elsevier B.V. All rights reserved.