Design and characterization of a two-axis, flexure-based nanopositioning stage with 50 mm travel and reduced higher order modes
Design and characterization of a two-axis, flexure-based nanopositioning stage with 50 mm travel and reduced higher order modes
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DOI：
10.1016/j.precisioneng.2018.04.007
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发表时间：
2018-07
期刊：
影响因子：
--
通讯作者：
N. Roy;M. Cullinan
中科院分区：
文献类型：
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作者：
N. Roy;M. Cullinan
长距离、高精度 XY 平台在扫描探针显微镜、光刻、微型增材制造、晶圆检测等领域有着广泛的应用。然而，找到具有成本效益、范围超过 12 毫米且精度优于一微米的精密运动平台是一项挑战。本研究介绍了两个基于 XY 弯曲的平台的参数化设计，其行程范围高达 50 毫米，分辨率为亚微米。首先，介绍了两轴双平行四边形弯曲平台的制造和测试，从有限元分析和实验测量中获得的结果与该平台的分析预测非常一致。还提出了具有减少的高阶模式和相同范围的修改级设计。这种改进的设计被证明能够实现 100nm 的开环分辨率，行程范围大于 50mm。改进级的高阶模式已被证明从双平行四边形弯曲 (DPF) 级中的 25Hz 转移到改进型 DPF 级中的 86Hz 以上，使得为改进级设计高速 (>10Hz) 控制器变得更加简单。
Long range, high precision, XY stages have a multitude of applications in scanning probe microscopy, lithography, micro-AM, wafer inspection and other fields. However, finding cost effective precision motion stages with a range of more than 12 mm with a precision better than one micron is a challenge. This study presents parametric design of the two XY flexure-based stages with a travel ranges of up to 50 mm and sub-micron resolution. First, the fabrication and testing of a two-axis double parallelogram flexure stage is presented and the results obtained from FEA and experimental measurements are shown to be in good agreement with the analytical predictions for this stage. A modified stage design with reduced higher order modes and same range, is also presented. This modified design is shown to be capable of achieving an open loop resolution of 100 nm with a travel range of greater than 50 mm. Higher order modes of the modified stage have been shown to be shifted from 25 Hz in the double parallelogram flexure (DPF) stage to over 86 Hz in the modified DPF stage making it much simpler to design a high speed (>10 Hz) controller for the modified stage.