Growth characteristics and formation mechanisms of Cu6Sn5 phase at the liquid-Sn0.7Cu/(111)(Cu) and liquid-Sn0.7Cu/(001)(Cu) joint interfaces
Growth characteristics and formation mechanisms of Cu6Sn5 phase at the liquid-Sn0.7Cu/(111)(Cu) and liquid-Sn0.7Cu/(001)(Cu) joint interfaces
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DOI:
10.1016/j.actamat.2015.11.034
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发表时间:
2016-02
期刊:
影响因子:
9.4
通讯作者:
Zhihao Zhang;Mingyu Li;Zhi-Quan Liu;Sen Yang
中科院分区:
文献类型:
--
作者:
Zhihao Zhang;Mingyu Li;Zhi-Quan Liu;Sen Yang
This work investigated the growth characteristics and formation mechanisms of the Cu 6 Sn 5 phase at the liquid-Sn 0.7 Cu/(111) Cu and liquid-Sn 0.7 Cu/(001) Cu joint interfaces. As a result of contributions from the interfacial environments, regular arrays of the roof-type Cu 6 Sn 5 grains with fixed intersecting angles were generated on both types of the Cu single crystals after soldering at 250° C for 1 s–1 h. At the liquid-Sn 0.7 Cu/Cu 6 Sn 5 interface, a hexagonal-rod-type growth mechanism for Cu 6 Sn 5 phase was proposed on the basis of its anisotropy in surface energy and roughness. According to this mechanism, the Cu 6 Sn 5 roofs formed on the (111) and (001) Cu pads would consistently elongate in the [0001] direction of Cu 6 Sn 5 phase, regardless of whether they belonged to the minimum mismatch direction of Cu 6 Sn 5 and Cu phases; and they would maintain the {11 2¯ 0} and {10 1¯ 0} planes as the side faces respectively, despite the reaction time being prolonged to 1 h. At the Cu 6 Sn 5/Cu interface, two types of the three-dimensional placement rules for Cu 6 Sn 5 roofs on the Cu single crystals were determined on the basis of the suitable Cu matches of these two phases. Specifically, the junction interfaces between Cu 6 Sn 5 roofs and Cu single crystals were confirmed to be‖{10 1¯ 0}‖{111} and {11 2¯ 0}‖{001}; and the parallel orientation relationships of {0001}‖{011} were always present on both types of interfaces. Our study can help to clarify the growth mechanism of Cu 6 Sn 5 phase and to provide a scientific basis of Cu 6 Sn 5 orientation design for three-dimensional integrated circuit interconnect applications.