Fundamental Study on Sputter Deposition of Ceramic Film by Large-Area Electron Beam Irradiation
Fundamental Study on Sputter Deposition of Ceramic Film by Large-Area Electron Beam Irradiation
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大面积电子束辐照溅射沉积陶瓷薄膜的基础研究
DOI：
10.1016/j.procir.2013.03.053
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
Motohiro Inoue
中科院分区：
文献类型：
--
作者：
Shuhei Misumi;Akira Okada;Yasuhiro Okamoto;Motohiro Inoue
采用大面积电子束辐照金属模具钢表面溅射沉积陶瓷膜。大面积EB具有足够高的能量密度，以在表面平滑处理期间在工件表面上方产生等离子体，这导致设置在工件表面附近的靶材料的溅射。溅射沉积靶材的同时，通过大面积电子束对工件表面进行表面熔化和再固化，将提高沉积膜与工件之间的附着力。将氧化铝或氧化锆制成的短陶瓷管作为靶置于钢基体表面，并对表面进行大面积电子束辐照。利用EDX和XRD分析了辐照后工件表面的成分和结构，探讨了大面积电子束辐照作为一种新的镀膜方法的可能性。
The sputter deposition of ceramic film on metal mold steel surface by large-area electron beam (EB) irradiation was discussed. The large-area EB has high energy density enough to generate plasma above the workpiece surface during the surface smoothing process, which causes the sputtering of target material set near the workpiece surface. The sputter deposition of target material with simultaneous surface melting and resolidification of workpiece surface by large-area EB would improve the adhesion between the deposited film and the workpiece. Short ceramic tube made of alumina or zirconia as a target was put on the substrate surface of steel, and large-area EB was irradiated to the surface. The workpiece surface component and structure after the irradiation were investigated using EDX and XRD analysis, in order to discuss the possibility of large-area EB irradiation as a new coating method.