Micromagnetics of soft magnetic thin films in presence of defects

Micromagnetics of soft magnetic thin films in presence of defects
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存在缺陷的软磁薄膜的微磁学

DOI:
10.1063/1.360432
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发表时间:
1995
期刊:
影响因子:
--
通讯作者:
K. Shiiki
K. Shiiki
中科院分区:
--
文献类型:
--
作者:
T. Komine;Y. Mitsui;K. Shiiki

文献摘要

被引文献

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通过数值求解朗道-Lifshitz-吉尔伯特方程,计算了含磁缺陷的磁性薄膜在4畴和7畴两种初始磁化状态下的磁化强度.涡流壁处的缺陷暂时抑制了磁化,但超过临界外磁场后,涡流壁会从缺陷中脱出。该临界场随着缺陷尺寸变大而增大。膜侧的缺陷固定膜边缘的磁化。边缘缺陷导致膜内的可再现的磁化状态,虽然局部稳定的结构出现的磁性薄膜没有缺陷。看来,该缺陷可以提高磁性薄膜磁头的稳定性。
We solve numerically the Landau‐Lifshitz‐Gilbert equation and calculate the magnetization in a magnetic film including a nonmagnetic defect for two initial magnetization states consisting of circular structure with 4 domains and 7 domains. The defect at the vortex wall restrains the magnetization temporarily but the vortex wall comes out of the defect beyond a critical applied field. This critical field increases as the defect size becomes large. The defect at the film side fixes the magnetization at the film edge. The edge defect leads to a reproducible magnetization state inside the film, though a locally stable structure appears for the magnetic thin film without defects. It seems that the defect may improve the stability of the magnetic thin film head.