Subwavelength direct-write nanopatterning using optically trapped microspheres
Subwavelength direct-write nanopatterning using optically trapped microspheres
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DOI：
10.1038/nnano.2008.150
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发表时间：
2008-07-01
影响因子：
38.3
通讯作者：
Arnold, Craig B.
中科院分区：
文献类型：
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作者：
McLeod, Euan;Arnold, Craig B.
许多非光刻技术现在可用于在纳米级上处理材料，包括能够产生比所使用的光的波长小得多的特征的光学技术（1-7）。然而，这些技术可能在速度、易用性、实现成本或它们可以写入的模式范围方面受到限制。在这里，我们报告如何贝塞尔光束激光捕获的微球近表面可以用来使近场直写（8，9）亚波长纳米图案。使用微球作为物镜透镜聚焦加工激光，我们展示了任意图案和个体特征，其最小尺寸类似于100 nm（小于加工波长的三分之一），并且在水性和化学环境中的定位精度优于40 nm。在近场物镜和衬底之间保持亚微米间距，而无需主动反馈控制。如果实现与阵列的光阱，这种方法可能会导致一个高吞吐量的探针为基础的方法，图案化表面的亚波长功能。
A number of non-lithographic techniques are now available for processing materials on the nanoscale, including optical techniques(1-7) capable of producing features that are much smaller than the wavelength of light used. However, these techniques can be limited in speed, ease of use, cost of implementation, or the range of patterns they can write. Here we report how Bessel beam laser trapping of microspheres near surfaces can be used to enable near-field direct-write(8,9) subwavelength nanopatterning. Using the microsphere as an objective lens to focus the processing laser, we demonstrate arbitrary patterns and individual features with minimum sizes of similar to 100 nm ( which is less than one-third the processing wavelength) and a positioning accuracy better than 40 nm in aqueous and chemical environments. Submicron spacing is maintained between the near-field objective and the substrate without active feedback control. If implemented with an array of optical traps, this approach could lead to a high-throughput probe-based method for patterning surfaces with subwavelength features.