Vertically Oriented, Three‐Dimensionally Tapered Deep‐Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography
Vertically Oriented, Three‐Dimensionally Tapered Deep‐Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography
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DOI：
10.1002/adma.201403098
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发表时间：
2014-11
影响因子：
29.4
通讯作者：
Sol‐Ah Lee;H. Kang;Jung-Ki Park;Seungwook Lee
中科院分区：
文献类型：
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作者：
Sol‐Ah Lee;H. Kang;Jung-Ki Park;Seungwook Lee
偶氮材料的场梯度、表面光流态化允许在大范围内形成特定的3D纳米轮廓，以便容易地获得3D锥形、深亚波长Au纳米孔(空间尺寸为20 nm)阵列。利用这种三维锥形的20 nm Au纳米孔，实现了可见光到深亚波长点的压缩和相应的超常光学传输(EOT)。
The field-gradient, superficial photo fluidization of azomaterials allows a specific 3D nano-silhouette to be shaped over a large area, so as to get easy access to a 3D-tapered, deep sub-wavelength Au nanohole (20 nm spatial size) array. The squeezing of visible light into the deep sub-wavelength point and the relevant extraordinary optical transmission (EOT) are achieved using this 3D-tapered, 20 nm Au nanohole.