Fabrication of (101)-oriented CsPbBr3 thick films with high carrier mobility using a mist deposition method
Fabrication of (101)-oriented CsPbBr3 thick films with high carrier mobility using a mist deposition method
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DOI：
10.7567/1882-0786/ab2c96
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发表时间：
2019-08-01
影响因子：
2.3
通讯作者：
Hirato, Tetsuji
中科院分区：
文献类型：
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作者：
Haruta, Yuki;Ikenoue, Takumi;Hirato, Tetsuji
CsPbBr 3具有优异的光电性能，是高灵敏度平板X射线探测器的理想材料。因此，需要一种在大面积（> 10 × 10cm（2））上制备厚CsPbBr 3膜（> 10 μ m）的方法。在这里，我们报告的厚CsPbBr 3薄膜的制造使用可扩展的雾沉积方法。在该方法中，通过沉积循环的数量来控制和放大膜厚度。所获得的CsPbBr 3薄膜由高度（101）取向的柱状晶体组成，并且具有13 cm（2）V-1s（-1）的高载流子迁移率，其与单晶相当。(C)2019日本应用物理学会
CsPbBr3 is a promising candidate for highly sensitive flat-panel X-ray detectors due to its excellent optoelectronic properties. Thus, a method of preparing thick CsPbBr3 films (>10 mu m) over large areas (>10 x 10 cm(2)) is required. Herein, we report the fabrication of thick CsPbBr3 films using a scalable mist deposition method. In this method, the film thickness was controlled and up-scaled by the number of deposition cycles. The obtained CsPbBr3 films were composed of highly (101)-oriented columnar crystals and had a high carrier mobility of 13 cm(2) V-1 s(-1), which is comparable to that for single crystals. (C) 2019 The Japan Society of Applied Physics