Laser micro structuring on a Si substrate for improving surface hydrophobicity
Laser micro structuring on a Si substrate for improving surface hydrophobicity
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DOI：
10.1088/0960-1317/19/8/085025
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发表时间：
2009-07
影响因子：
2.3
通讯作者：
X. Wang;L. Wu;Q. Shao;H. Zheng
中科院分区：
文献类型：
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作者：
X. Wang;L. Wu;Q. Shao;H. Zheng
本文报道了硅基板上的 355 nm 二极管泵浦固态 (DPSS) 紫外 (UV) 激光诱导表面纹理化。由微米级凹坑组成的表面图案是通过直接激光烧蚀产生的。通过微调激光束注量、脉冲数和束斑间隔等关键工艺变量，在硅表面上生成了具有纳米特征的均匀且可重复的微图案。在适当的最佳激光条件下，Si衬底的表面接触角从64.2°增加到97.5°。此外，还证明了激光纹理化的硅基板可以用作压印的模板。将激光诱导图案压印到溶胶-凝胶薄膜上后，由于两层粗糙表面，溶胶-凝胶薄膜表面接触角增加了近30°，达到138°。
355 nm diode-pumped solid-state (DPSS) ultraviolet (UV) laser-induced surface texturing on a Si substrate is reported in this paper. Surface patterns consisting of miro-size pits were produced by direct laser ablation. By fine-tuning key process variables such as laser beam fluence, pulse number, and beam spot separation, uniform and repeatable micropatterns with nano features have been generated on the Si surface. Under appropriate optimum laser conditions, the surface contact angle of the Si substrate was increased from 64.2° to 97.5°. Furthermore, it was demonstrated that the laser textured Si substrate could be used as a template for imprinting. After imprinting the laser-induced pattern onto the sol–gel film, the sol–gel film surface contact angle was increased by nearly 30° up to 138° due to two-tier rough surfaces.