Generation of acid sites by SiO2 deposition on groups IVB metal oxides
Generation of acid sites by SiO2 deposition on groups IVB metal oxides
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DOI：
10.1016/0021-9517(92)90233-8
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发表时间：
1992-03
影响因子：
7.3
通讯作者：
M. Niwa;N. Katada;Y. Murakami
中科院分区：
文献类型：
--
作者：
M. Niwa;N. Katada;Y. Murakami
采用化学气相沉积法在二氧化钛和氧化锆表面沉积了Si（OCH 3）4薄膜。通过覆盖度的测定、探针分子的红外光谱和测试反应研究了表面结构与酸性的关系。沉积二氧化硅以形成与氧化物阳离子（-M ↑ [2] Si-）的1：1复合物，直到获得超过90%的单层覆盖。二氧化硅覆盖层显示出弱的布朗斯台德酸性，仅足以催化1-丁烯的异构化和叔丁醇的脱水。酸性不能与配位数或阳离子的价态的差异，但似乎与二氧化硅和金属氧化物之间的相互作用。
An ultra thin silica layer was prepared by chemical vapor deposition of Si(OCH3)4onto titania and zirconia. The relationship between surface structure and acidity was studied by measurement of coverage, IR spectroscopy of probe molecules, and test reactions. Silica was deposited to form a 1 : 1 complex with the oxide cation (-MSi-), until more than 90% of monolayer coverage was obtained. The silica overlayer showed weak Brønsted acidity only sufficient to catalyze the isomerization of 1-butene and the dehydration oftert-butyl alcohol. The acidity could not be correlated with the difference in coordination number or valence of cations but seemed to correlate with the interaction between silica and metal oxide.