Development of high-accuracy x-ray ptychography apparatus
Development of high-accuracy x-ray ptychography apparatus
复制标题
高精度X射线叠层描记仪的研制
DOI:
10.1088/1742-6596/463/1/012039
复制
发表时间:
2013
期刊:
影响因子:
--
通讯作者:
and Y. Takahashi
中科院分区:
文献类型:
--
作者:
A. Suzuki;Y. Senba;H. Ohashi;Y. Kohmura;K. Yamauchi;T. Ishikawa;and Y. Takahashi
X-ray ptychography allows us to observe the internal structures of non-isolated objects without lenses. We developed a high-accuracy X-ray ptychography apparatus equipped with Kirkpatrick-Baez mirrors. The full width at half-maximum of the focal profiles was~ 600 nm for the vertical and horizontal directions. The estimated flux was~ 3× 10 7 photons/s. We also developed a constant-temperature system to suppress sample and/or beam drift during measurements. The temperature change of the apparatus was controlled to less than 0.04 C over 10 hours. The total amount of drift over 10 hours was suppressed to less than 500 nm. By using both the constant-temperature system and a drift compensation method, the reconstructed image of the test object was markedly improved.