Deformation analysis of MEMS structures by modified digital moire methods

Deformation analysis of MEMS structures by modified digital moire methods
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通过改进的数字莫尔法对 MEMS 结构进行变形分析

DOI:
10.1016/j.optlaseng.2009.12.007
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发表时间:
2010-11-01
影响因子:
4.6
通讯作者:
Gao, Jianxin
Gao, Jianxin
中科院分区:
工程技术2区
文献类型:
--
作者:
Liu, Zhanwei;Lou, Xinhao;Gao, Jianxin

文献摘要

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微加工机电系统变形的定量分析对于微系统的设计和功能控制具有重要意义。本文提出了两种改进的数字云纹处理方法,即高斯模糊法与数字相移相结合的方法和基于数字云纹法的几何相位分析(GPA)技术,用于定量分析微机电系统(MEMS)结构的变形行为。数字莫尔条纹图是通过将直接蚀刻在微结构表面上的样品光栅与数字参考光栅(DRG)叠加而产生的。该方法消除了数字莫尔条纹中的大部分光栅噪声,使莫尔条纹的相位分布可以直接得到。MEMS结构的应变测量结果证明了这两种方法的可行性(C)2010 Elsevier Ltd版权所有
Quantitative deformation analysis of micro-fabricated electromechanical systems is of importance for the design and functional control of microsystems. In this paper, two modified digital moire processing methods, Gaussian blurring algorithm combined with digital phase shifting and geometrical phase analysis (GPA) technique based on digital moire method, are developed to quantitatively analyse the deformation behaviour of micro-electro-mechanical system (MEMS) structures Measuring principles and experimental procedures of the two methods are described in detail. A digital moire fringe pattern is generated by superimposing a specimen grating etched directly on a microstructure surface with a digital reference grating (DRG). Most of the grating noise is removed from the digital moire fringes, which enables the phase distribution of the moire fringes to be obtained directly. Strain measurement result of a MEMS structure demonstrates the feasibility of the two methods (C) 2010 Elsevier Ltd All rights reserved