Radioluminescence and thermally-stimulated luminescence of SiO2 glasses prepared by spark plasma sintering
Radioluminescence and thermally-stimulated luminescence of SiO2 glasses prepared by spark plasma sintering
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DOI：
10.2109/jcersj2.15227
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发表时间：
2016-05-01
影响因子：
1.1
通讯作者：
Yanagida, Takayuki
中科院分区：
文献类型：
--
作者：
Okada, Go;Kasap, Safa;Yanagida, Takayuki
用火花等离子烧结法制备了大块SiO2玻璃，并对其进行了剂量计应用。辐射发光的温度依赖性研究表明，存在两组可能的发光中心，它们在385和511 nm处显示发射。在室温下，前一种发射为主，而在后一种发射在低温下显著增加，特别是在200 K以下。这些排放物的来源分别归因于一对硅烯中心和二氧硅烷和硅烯。样品经过辐照后，在160℃左右和300℃以上观察到热激发光（TSL），其中发射主要为385 nm组分。TSL强度与所传递的辐射剂量成线性比例，并且在10(0)-10(4)mGy之间有线性动态范围。(C) 2016日本陶瓷学会。版权所有。
Bulk SiO2 glasses have been prepared by spark plasma sintering and characterized towards dosimeter applications. The temperature dependence studies of radioluminescence suggest that there are two possible groups of luminescent centres, which show emissions at 385 and 511 nm. At room temperature, the former emission is predominant while the latter emission significantly increases at low temperatures, especially below 200 K. The origins of these emissions are attributed to a pair of silylene centres and dioxasilirane and silylene, respectively. After irradiating the sample, thermally-stimulated luminescence (TSL) is observed around 160 degrees C and above 300 degrees C, in which the emission is mainly the 385 nm component. The TSL intensity is linearly proportional to the radiation dose delivered, and a linear dynamic range has been demonstrated over 10(0)-10(4) mGy. (C) 2016 The Ceramic Society of Japan. All rights reserved.