Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns.

Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns.
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DOI:
10.1039/c5sm00474h
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发表时间:
2015-05
期刊:
影响因子:
3.4
通讯作者:
Yong-Biao Yang;Young Joo Choi;S. Kim;Jaeup U. Kim
Yong-Biao Yang;Young Joo Choi;S. Kim;Jaeup U. Kim
中科院分区:
化学2区
文献类型:
--
作者:
Yong-Biao Yang;Young Joo Choi;S. Kim;Jaeup U. Kim

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使用理论和实验,我们研究了在稀疏图案化基底上创建完全有序的嵌段共聚物纳米结构的可能性。我们的研究重点是仔细检查适当的图案条件,以避免不希望的形态或缺陷时,沉积圆柱形形成AB二嵌段共聚物薄膜上的基板上,大多是中性的周期性条纹区域,首选少数域。通过自洽场理论(SCFT)对参数空间的系统探索,确定了目标相的最佳条件,并研究了化学图案周期和嵌段共聚物膜厚度对目标相稳定性的影响。此外,作为样本实验系统,证明了几乎完美排列的聚苯乙烯-嵌段-聚甲基丙烯酸甲酯(PS-b-PMMA)二嵌段共聚物。在图案转移过程之后,创建遵循初始垂直对准圆柱图案的高度有序的Al纳米点阵列。这项系统的研究表明,控制稀疏化学图案上纳米粒子的结构和位置的能力。
Using both theory and experiment, we investigate the possibility of creating perfectly ordered block copolymer nanostructures on sparsely patterned substrates. Our study focuses on scrutinizing the appropriate pattern conditions to avoid undesired morphologies or defects when depositing cylinder-forming AB diblock copolymer thin films on the substrates which are mostly neutral with periodic stripe regions preferring the minority domain. By systematically exploring the parameter space using self-consistent field theory (SCFT), the optimal conditions for target phases are determined, and the effects of the chemical pattern period and the block copolymer film thickness on the target phase stability are also studied. Furthermore, as a sample experimental system, almost perfectly aligned polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers are demonstrated. After the pattern transfer process, highly ordered Al nanodot arrays following the initial vertically aligned cylinder pattern are created. This systematic study demonstrates the ability to control the structure and the position of nanopatterns on sparse chemical patterns.