Fabrication of 3-dimensional microstructures using moving mask deep X-ray lithography (M/sup 2/DXL)
Fabrication of 3-dimensional microstructures using moving mask deep X-ray lithography (M/sup 2/DXL)
复制标题
使用移动掩模深 X 射线光刻技术制造 3 维微结构 (M/sup 2/DXL)
DOI：
10.1109/memsys.2001.906487
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
K. Yamamoto
中科院分区：
文献类型：
--
作者：
O. Tabata;N. Matsuzuka;T. Yamaji;Hui You;J. Minakuchi;K. Yamamoto
已经开发出两种方法，“正向方法”和“反向方法”，通过深X射线光刻制造复杂的3维微结构。在“前向方法”中，使用 X 射线掩模图案和掩模移动轨迹计算 PMMA 基板上的曝光能量分布。制造了两种不同的微喷嘴图案来证明这种方法的可行性。通过预测与实验的比较，观察到一个与长寿命自由基有关的新现象。作为“逆方法”，开发了一种使用傅里叶变换来确定最佳掩模移动轨迹的方法。
Two methods, "Forward Approach" and "Inverse Approach", to fabricate complicated 3-dimensional microstructures by deep X-ray lithography have been developed. In the "Forward Approach", exposure energy distribution on a PMMA substrate was calculated using X-ray mask pattern and mask moving trajectories. Two different micro-nozzle patterns were fabricated to demonstrate the feasibility of this approach. From the comparison between prediction and experiment, a new phenomenon related to the long lifetime radicals was observed. As the "Inverse Approach", a method to determine the optimum mask moving trajectory using Fourier transformation was developed.