A character projection low energy electron beam direct writing system for device of small production lot with a variety of design
A character projection low energy electron beam direct writing system for device of small production lot with a variety of design
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一种小批量多品种设计的字符投影低能电子束直写系统
DOI：
10.1117/12.655963
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发表时间：
2006
期刊：
影响因子：
--
通讯作者：
H. Mizuno
中科院分区：
文献类型：
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作者：
F. Nakamura;Katsuhide Watanabe;H. Kinoshita;Hiroyuki Shinozaki;Yasushi Kojima;S. Morita;K. Noguchi;Norihiro Yamaguchi;Hisashi Isokawa;Kazuhiko Kushitani;Takayuki Satoh;T. Koshiba;Takumi Oota;T. Nakasugi;H. Mizuno
一个字符投影（CP）型，低能量，电子束直写（EBDW）系统，快速周转时间和掩模少的小批量生产的设备制造具有多种设计已经开发出来。该系统被称为EBIS（电子束集成系统），可以满足EBDW的一系列要求，包括更高的吞吐量和无掩模曝光。标准化的CP孔径方法可以减少EB拍摄次数，而无需频繁制作孔径，已被用作实现有效CP和无掩模制造的方法。这一突破只能通过使用具有自由邻近效应优势的低能量EB来实现。为了解决临界低能电子束问题，开发并使用了一种紧凑的电子束柱，该电子束柱配备有用于限制由库仑相互作用引起的束模糊的单片偏转器和透镜。足够的分辨率，对应于100 nm的L/S图案，通过使用薄层抗蚀剂工艺获得。作为标记检测方法，使用使用微通道板的电压对比成像。该方法使得在使用低能量EB时检测掩埋标记成为可能。作者目前正在验证该EBIS的基本性能。本文概述并讨论了该系统的几何细节和性能数据。
A character projection (CP)-type, low energy, electron beam direct writing (EBDW) system, for quick-turn-around-time and mask-less device fabrications of small production lots featuring a variety of designs has been developed. This system, named the EBIS (Electron Beam Integrated System), can satisfy a set of requirements for EBDWs, including higher throughput and mask-less exposure. A standardized CP aperture method that enables reduction in the number of EB shots without frequent aperture making has been applied as a means for attaining effective CP and mask-less fabrication. This breakthrough was able to be realized only by using low energy EB with the advantage of the free proximity effect. To resolve critical low energy EB issues, a compact EB column, equipped with monolithic deflectors and lenses for restricting beam blur caused by Coulomb interaction, was developed and put to use. Sufficient resolution, corresponding to 100 nm L/S patterns, was attained by using a thin-layered resist process. As the mark detection method, voltage contrast imaging using a micro channel plate was used. This method made it possible to detect buried marks when using low energy EB. The authors are currently verifying the basic performance of this EBIS. This paper outlines and discusses geometrical details and performance data of this system.