Low‐loss polycrystalline silicon waveguides for silicon photonics
Low‐loss polycrystalline silicon waveguides for silicon photonics
复制标题
用于硅光子学的低损耗多晶硅波导
DOI：
10.1063/1.363686
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发表时间：
1996
影响因子：
3.2
通讯作者：
L. Kimerling
中科院分区：
文献类型：
--
作者：
A. Agarwal;L. Liao;J. Foresi;M. Black;X. Duan;L. Kimerling
硅中的光子集成电路需要通过与硅兼容的材料进行波导，这是一种超大规模集成电路技术。与二氧化硅和空气相比，多晶硅具有更高的折射率，是硅光互连技术的理想候选者。尽管它有很多优点，但这项技术需要克服的最大障碍是，在沉积的体多晶硅结构中测得的损耗为350分贝/厘米，而在晶体硅制作的波导中测得的损耗为1分贝/厘米。我们报告了减少散射和吸收的方法，这是该系统中损失的主要来源。为了减少表面散射损耗，我们在光滑的再结晶非晶硅和化学机械抛光的多晶硅中制作了光波导，这两种材料的损耗都降低了约40分贝/厘米。用原子力显微镜和分光光度法对表面粗糙度进行了监测，表面粗糙度从19-20 nm的均方根值降到了平均表面粗糙度。
Photonic integrated circuits in silicon require waveguiding through a material compatible with silicon very large scale integrated circuit technology. Polycrystalline silicon (poly‐Si), with a high index of refraction compared to SiO2 and air, is an ideal candidate for use in silicon optical interconnect technology. In spite of its advantages, the biggest hurdle to overcome in this technology is that losses of 350 dB/cm have been measured in as‐deposited bulk poly‐Si structures, as against 1 dB/cm losses measured in waveguides fabricated in crystalline silicon. We report methods for reducing scattering and absorption, which are the main sources of losses in this system. To reduce surface scattering losses we fabricate waveguides in smooth recrystallized amorphous silicon and chemomechanically polished poly‐Si, both of which reduce losses by about 40 dB/cm. Atomic force microscopy and spectrophotometry studies are used to monitor surface roughness, which was reduced from an rms value of 19–20 nm down to ab...