Hydrogen-related structural changes on CVD diamond (1 0 0) surfaces by ultra-high-vacuum annealing

Hydrogen-related structural changes on CVD diamond (1 0 0) surfaces by ultra-high-vacuum annealing
复制标题

超高真空退火 CVD 金刚石 (1 0 0) 表面与氢相关的结构变化

DOI:
10.1016/s0169-4332(03)00509-9
复制
发表时间:
2003
期刊:
影响因子:
--
通讯作者:
Tsuyohito Ito
Tsuyohito Ito
中科院分区:
--
文献类型:
--
作者:
J. Nakamura;S. Fukumoto;T. Teraji;H. Murakami;Tsuyohito Ito

文献摘要

被引文献

相似文献

使用超高真空 (UHV) 扫描隧道显微镜 (STM),我们研究了通过微波等离子体 (MWP) 化学气相沉积 (CVD) 方法同质外延生长的单晶 (100) 金刚石的表面原子结构。从 B 掺杂(p 型)生长(H 端接)金刚石样品中获取的 STM 图像显示出部分非晶状结构和与 H 端接金刚石 (100) 的 (2×1)/(1×2) 结构特征相关的部分不清楚的特征。虽然后者的结构随着远低于 500°C 的特高压退火处理的时间和温度的增加而变得更加清晰,但只有在高于 500°C 的充分退火后才能获得基本上清晰的 (2×1)/(1×2) 结构图像。在 150–200°C 进行适度的 UHV 退火有时会导致在 (2×1)/(1×2) 结构旁边的非常有限的区域中出现无序的短程 (3×1) 结构,其特征是行间距为 0.35 和 0.40 nm。这些观察结果表明,在最上表面存在 CH 和 CH2 键,在 UHV 退火和 CH 键的最终表面占据过程中,CH 和 CH2 物质的表面分数发生微小但可能的变化。此外,还讨论了 (2×1) 结构的占据和未占据状态的 STM 图像与表面 CH 键的成键和反成键状态的不同特征。
Using an ultra-high-vacuum (UHV) scanning tunneling microscope (STM), we have investigated surface atomic structures of single-crystalline (100) diamond homoepitaxially grown by means of a microwave-plasma (MWP) chemical-vapor-deposition (CVD) method. STM images taken from B-doped (p-type) as-grown (H-terminated) diamond samples showed partially amorphous-like structures and partially unclear features related to (2×1)/(1×2) structures characteristic of H-terminated diamond (100). While the latter structures became clearer with increasing periods and temperatures of UHV annealing treatments well below 500°C, substantially clear (2×1)/(1×2) structure images were obtained only after a sufficient annealing above 500°C. A moderate UHV annealing at 150–200°C sometimes resulted in the presence of disordered short-range (3×1) structures featured by row separations of 0.35 and 0.40nm in very limited areas beside the (2×1)/(1×2) structures. These observations suggest the existence of both CH and CH2bonds at the topmost surfaces, substantially small but possible changes in surface fractions of the CH and CH2species during the UHV annealing and the final surface occupation of the CH bonds. In addition, STM images differently featured for both occupied and unoccupied states of the (2×1) structure are discussed in relation to bonding and anti-bonding states of the surface CH bonds.