Hydrogen-related structural changes on CVD diamond (1 0 0) surfaces by ultra-high-vacuum annealing
Hydrogen-related structural changes on CVD diamond (1 0 0) surfaces by ultra-high-vacuum annealing
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超高真空退火 CVD 金刚石 (1 0 0) 表面与氢相关的结构变化
DOI:
10.1016/s0169-4332(03)00509-9
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发表时间:
2003
期刊:
影响因子:
--
通讯作者:
Tsuyohito Ito
中科院分区:
文献类型:
--
作者:
J. Nakamura;S. Fukumoto;T. Teraji;H. Murakami;Tsuyohito Ito
Using an ultra-high-vacuum (UHV) scanning tunneling microscope (STM), we have investigated surface atomic structures of single-crystalline (100) diamond homoepitaxially grown by means of a microwave-plasma (MWP) chemical-vapor-deposition (CVD) method. STM images taken from B-doped (p-type) as-grown (H-terminated) diamond samples showed partially amorphous-like structures and partially unclear features related to (2×1)/(1×2) structures characteristic of H-terminated diamond (100). While the latter structures became clearer with increasing periods and temperatures of UHV annealing treatments well below 500°C, substantially clear (2×1)/(1×2) structure images were obtained only after a sufficient annealing above 500°C. A moderate UHV annealing at 150–200°C sometimes resulted in the presence of disordered short-range (3×1) structures featured by row separations of 0.35 and 0.40nm in very limited areas beside the (2×1)/(1×2) structures. These observations suggest the existence of both CH and CH2bonds at the topmost surfaces, substantially small but possible changes in surface fractions of the CH and CH2species during the UHV annealing and the final surface occupation of the CH bonds. In addition, STM images differently featured for both occupied and unoccupied states of the (2×1) structure are discussed in relation to bonding and anti-bonding states of the surface CH bonds.