Dependence of dark matter - electron scattering on the galactic dark matter velocity distribution
Dependence of dark matter - electron scattering on the galactic dark matter velocity distribution
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DOI：
10.1088/1475-7516/2021/02/004
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发表时间：
2020-11
影响因子：
6.4
通讯作者：
Aria Radick;Anna-Maria Taki;T. Yu
中科院分区：
文献类型：
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作者：
Aria Radick;Anna-Maria Taki;T. Yu
暗物质-电子散射率取决于暗物质晕的潜在速度分布。重要的是，暗物质-电子散射对高速尾部特别敏感，不同的暗物质晕模型之间存在显著差异。在这项工作中，我们总结了主要的晕模型，并讨论了进入它们的各种参数。根据最近的研究和测量，我们建议更新这些参数的值。此外，我们量化了暗物质-电子散射率与晕模型和参数选择的依赖关系，并证明了这些选择是如何传播到预测的截面极限的。这一速率对圆周速度V0的变化最敏感；在硅靶中，我们发现，对于接触相互作用，速率预测的变化范围可以从𝒪(0.01%)到𝒪(100%)，对于远程相互作用，速率预测的变化可以从𝒪(10%)到𝒪(100%)。
The rate of dark matter-electron scattering depends on the underlying velocity distribution of the dark matter halo. Importantly, dark matter-electron scattering is particularly sensitive to the high-velocity tail, which differs significantly amongst the various dark matter halo models. In this work, we summarize the leading halo models and discuss the various parameters which enter them. We recommend updated values for these parameters based on recent studies and measurements. Furthermore, we quantify the dependence of the dark matter-electron scattering rate on the choice of halo model and parameters, and demonstrate how these choices propagate to the predicted cross-section limits. The rate is most sensitive to changes in the circular velocity v0; in silicon targets, we find that the changes in the rate predictions can range from 𝒪(0.01%) to 𝒪(100%) for contact interactions and 𝒪(10%) to 𝒪(100%) for long-range interactions.