Heat resistance of Mo/Si, MoSi2/Si, and Mo5Si3/Si multilayer soft x‐ray mirrors
Heat resistance of Mo/Si, MoSi2/Si, and Mo5Si3/Si multilayer soft x‐ray mirrors
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DOI：
10.1063/1.359698
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发表时间：
1995-11
影响因子：
3.2
通讯作者：
H. Takenaka;T. Kawamura;Y. Ishii;Satoru Asagiri
中科院分区：
文献类型：
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作者：
H. Takenaka;T. Kawamura;Y. Ishii;Satoru Asagiri
评估了加热对Mo/Si和Mo-硅化物/Si（MoSi 2/Si和Mo 5Si 3/Si）多层膜的反射率和层状结构的影响。在300 °C以上加热后，Mo/Si多层膜的Cu-K α x射线反射率和周期长度显着下降，而Mo-硅化物/Si多层膜的Cu-K α x射线反射率和周期长度即使在加热至600 °C后也仅略有变化。透射电子显微镜观察显示，与Mo/Si多层相比，Mo-硅化物/Si多层中的热致劣化明显更少，表明Mo-硅化物/Si多层具有比Mo/Si多层更好的耐热性。
The effects of heating on both the reflectivity and layered structures of Mo/Si and Mo‐silicide/Si (MoSi2/Si and Mo5Si3/Si) multilayers were evaluated. The Cu‐Kα x‐ray reflectivity and the periodic length of the Mo/Si multilayer markedly decreased after heating at above 300 °C, while those of the Mo‐silicide/Si multilayers changed only slightly even after heating up to 600 °C. Transmission electron microscopy observations revealed markedly less thermally induced deterioration in the Mo‐silicide/Si multilayers than in the Mo/Si multilayer, indicating that Mo‐silicide/Si multilayers have better heat resistance than Mo/Si multilayers.