Experimental estimation of charge neutrality level of SiO2

Experimental estimation of charge neutrality level of SiO2
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SiO2 电荷中性水平的实验估算

DOI:
10.1016/j.apsusc.2017.06.078
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发表时间:
2017
影响因子:
6.7
通讯作者:
Wang Wenwu
Wang Wenwu
中科院分区:
材料科学1区
文献类型:
--
作者:
Zhang Jing;Wei Shuhua;Wang Xiaolei;Xiang Jinjuan;Wang Wenwu

文献摘要

相似文献

利用X射线光电子能谱(XPS)研究了不同SiO2厚度的SiO2/Si叠层的导带偏移(CBO),实验提取了SiO2的电中性能级。CBO被发现是依赖于SiO2的厚度。通过用能隙态和电中性能级模型模拟SiO2的CBO与厚度的关系,确定SiO2的CNL为价带顶以上4 eV.
The charge neutrality level of SiO2is experimentally extracted by investigating conduction band offset (CBO) of SiO2/Si stack with different SiO2thicknesses using X-ray photoelectron spectroscopy. The CBO is found to be dependent on SiO2thickness. The CNL of SiO2is determined to be 4 eV above valence band maximum by modeling the CBO vs. thickness of SiO2using gap states and charge neutrality level based model.