Quantitative interface models for simulating microstructure evolution
Quantitative interface models for simulating microstructure evolution
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用于模拟微观结构演化的定量界面模型
DOI：
10.1016/j.actamat.2003.10.017
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发表时间：
2004
期刊：
影响因子：
9.4
通讯作者：
Long
中科院分区：
文献类型：
--
作者：
Jingzhi Zhu;Tao Wang;Shihuai Zhou;Zi;Long
为了定量模拟真实的体系中的微结构演化，我们研究了三种不同的界面模型：由DICTRA软件实现的锐界面模型和使用物理序参量或人工序参量的扩散界面模型。本文考虑了Ni-Al二元合金中γ′相在过饱和γ基体中的扩散控制生长。这三种模型都使用来自相同数据库的热力学和动力学参数。结果表明，不同模式下的组分时间演化曲线基本一致。重点是研究每个模型的优点和缺点，适用于合金的微观结构演变。
To quantitatively simulate microstructural evolution in real systems, we investigated three different interface models: a sharp-interface model implemented by the software DICTRA and two diffuse-interface models which use either physical order parameters or artificial order parameters. A particular example is considered, the diffusion-controlled growth of a γ′precipitate in a supersaturated γ matrix in Ni–Al binary alloys. All three models use the thermodynamic and kinetic parameters from the same databases. The temporal evolution profiles of composition from different models are shown to agree with each other. The focus is on examining the advantages and disadvantages of each model as applied to microstructure evolution in alloys.